Timelines · Sourced data

Silicon Real Estate

Memory dies drawn at the same scale beside a U.S. quarter, so a bigger box is more silicon and the coin shows how big that is. Switch between NAND, from planar chips of the early 2000s to recent 3D dies, and DRAM, where the few areas that teardown labs have measured are worth drawing. Every area links to the paper, release or teardown it comes from.

Show the dies of

NAND: how to read it

A flash die is a rectangle of silicon cut from a wafer. Its area decides how many fit on one wafer, which is one of the things that sets a die’s cost, and bit density (gigabits per square millimeter) is how a maker fits more bits into the same silicon. The stage draws each die at one scale, so a box twice the size really is twice the area.

Most sources print a die’s area but not its width and height. Those dies are drawn as squares of the same area, so a shape can mislead even when the size is right. Planar and 3D dies sit on the same field, but they are different structures: a 3D die gets its capacity from stacked layers, not from smaller cells alone.

The full list of these dies, with every other figure, is on the NAND die timeline.

The dies at one scale27 drawn

The ruled squares are 10 mm across, and the circle is a U.S. quarter drawn at the same scale. Both boards start at 4 pixels per millimeter, near real size on a desktop screen, so hold a quarter up to the screen to compare. Drag the scale to zoom, pick a maker, or select a die for its figures.

  • Samsung
  • SK hynix
  • Micron
  • Kioxia/WD
  • YMTC
  • Intel
768Gb 3b/cell 3D floating-gate NAND with CMOS under array (Micron and Intel, ISSCC 2016 paper 7.7)179.2 mm²
34nm 32Gb MLC (Intel and Micron)172 mm²
32-layer 384Gb TLC (Micron and Intel) (die area from a secondary source)168.2 mm²
25nm 64Gb MLC (Intel and Micron)167 mm²
32nm 32Gb MLC planar NAND (ISSCC 2010)159 mm²
BiCS4 1.33Tb QLC (96 WL layers)158.4 mm²
24nm 64Gb MLC planar NAND (ISSCC 2011)151 mm²
70nm 8Gb MLC planar NAND (JSSC 2006)146 mm²
32nm 32Gb MLC planar NAND (Lee et al., ISSCC 2010)146 mm²
BiCS3 512Gb TLC (Toshiba/WD, 64 WL layers)132 mm²
14nm 128Gb MLC planar NAND (ISSCC 2016 paper 7.5)130 mm²
120nm 1Gb planar NAND (Lee et al., JSSC 2002)129.6 mm²
4th-gen V-NAND 512Gb TLC (64 WL)128.5 mm²
130nm 1Gb planar NAND (JSSC 2002)125 mm²
43nm 16Gb MLC planar NAND (ISSCC 2008)120 mm²
20nm 64Gb MLC (Intel and Micron)118 mm²
19nm 64Gb MLC planar NAND (ISSCC 2012)112.8 mm²
BiCS 48-layer 256Gb TLC (Toshiba) (die area from a secondary source)105.4 mm²
56nm 8Gb MLC planar NAND (ISSCC 2006)98.8 mm²
16nm 64Gb MLC planar NAND (ISSCC 2014)93.4 mm²
144L FG 1Tb QLC (product interface speed from a review, secondary source)74.03 mm²
ISSCC 2019 512Gb TLC 128 WL layers, CuA, 4-plane66 mm²
64-layer 256Gb TLC (Xtacking) (die area from a secondary source)57.96 mm²
176-layer TLC (replacement gate) (die area from a secondary source)49.84 mm²
176L TLC 512Gb (4D PUC) (die area from a secondary source)46.5 mm²
321-layer 1Tb TLC (die area from a secondary source)43.54 mm²
X4-9060 512Gb TLC (Xtacking 4.0) (die area from a secondary source)40.44 mm²
U.S. quarter, 24.26 mm
10 mm

Every die is drawn at the same scale as the quarter beside it, so a bigger box is a bigger piece of silicon. Each die is drawn as a square of its area, because no source printed a width and height.

Density by year27 dated dies

Bit density is capacity divided by die area, so a smaller die for the same capacity sits higher. It is computed here from the two printed figures, not typed in.

Bit density of the drawn dies by year (Gb/mm²)

  • Samsung
  • SK hynix
  • Micron
  • Kioxia/WD
  • YMTC
  • Intel
0.0010.010.111010020022004200620082010201220142016201820202022202420262024: 321-layer 1Tb TLC (die area from a secondary source), 23.52 Gb/mm²2017: BiCS3 512Gb TLC (Toshiba/WD, 64 WL layers), 3.88 Gb/mm²2020: BiCS4 1.33Tb QLC (96 WL layers), 8.62 Gb/mm²2019: ISSCC 2019 512Gb TLC 128 WL layers, CuA, 4-plane, 7.76 Gb/mm²2021: 176L TLC 512Gb (4D PUC) (die area from a secondary source), 11.01 Gb/mm²2021: 144L FG 1Tb QLC (product interface speed from a review, secondary source), 13.83 Gb/mm²2016: 4th-gen V-NAND 512Gb TLC (64 WL), 3.98 Gb/mm²2024: X4-9060 512Gb TLC (Xtacking 4.0) (die area from a secondary source), 12.66 Gb/mm²2020: 176-layer TLC (replacement gate) (die area from a secondary source), 10.27 Gb/mm²2019: 64-layer 256Gb TLC (Xtacking) (die area from a secondary source), 4.42 Gb/mm²2015: 32-layer 384Gb TLC (Micron and Intel) (die area from a secondary source), 2.28 Gb/mm²2015: BiCS 48-layer 256Gb TLC (Toshiba) (die area from a secondary source), 2.43 Gb/mm²2002: 130nm 1Gb planar NAND (JSSC 2002), 0.008 Gb/mm²2002: 120nm 1Gb planar NAND (Lee et al., JSSC 2002), 0.008 Gb/mm²2005: 70nm 8Gb MLC planar NAND (JSSC 2006), 0.055 Gb/mm²2006: 56nm 8Gb MLC planar NAND (ISSCC 2006), 0.081 Gb/mm²2008: 43nm 16Gb MLC planar NAND (ISSCC 2008), 0.133 Gb/mm²2008: 34nm 32Gb MLC (Intel and Micron), 0.186 Gb/mm²2010: 25nm 64Gb MLC (Intel and Micron), 0.383 Gb/mm²2010: 32nm 32Gb MLC planar NAND (ISSCC 2010), 0.201 Gb/mm²2010: 32nm 32Gb MLC planar NAND (Lee et al., ISSCC 2010), 0.219 Gb/mm²2011: 24nm 64Gb MLC planar NAND (ISSCC 2011), 0.424 Gb/mm²2011: 20nm 64Gb MLC (Intel and Micron), 0.542 Gb/mm²2012: 19nm 64Gb MLC planar NAND (ISSCC 2012), 0.567 Gb/mm²2013: 16nm 64Gb MLC planar NAND (ISSCC 2014), 0.685 Gb/mm²2016: 14nm 128Gb MLC planar NAND (ISSCC 2016 paper 7.5), 0.985 Gb/mm²2016: 768Gb 3b/cell 3D floating-gate NAND with CMOS under array (Micron and Intel, ISSCC 2016 paper 7.7), 4.29 Gb/mm²
Log scale. Only the dies on this page are plotted, not every die ever made.

Every figure and its source27 rows

Tap a heading to sort. Sort by capacity to rank the dies by how much each holds, or by the quarter column to rank them by how much a quarter-sized patch of each would hold, in gigabytes (gigabits over 8). Each area links to the paper, release or teardown page it was read from.

DieMakerYearCapacityArea (mm²)Gb/mm²Quarter-sized patch (GB)Source
321-layer 1Tb TLC (die area from a secondary source)SK hynix20241 Tb43.5423.52computed1,359computedSK hynix H25GTD0 321-Layer (V9) 1 Tb TLC 3D NAND Process Flow Analysis
X4-9060 512Gb TLC (Xtacking 4.0) (die area from a secondary source)YMTC2024512 Gb40.4412.66computed732computedYMTC Xtacking4.0: Breaking New Ground in 3D NAND Technology
144L FG 1Tb QLC (product interface speed from a review, secondary source)Intel20211 Tb74.0313.83computed799computed30.2 A 1Tb 4b/Cell 144-Tier Floating-Gate 3D-NAND Flash Memory with 40MB/s Program Throughput and 13.8Gb/mm2 Bit Density
176L TLC 512Gb (4D PUC) (die area from a secondary source)SK hynix2021512 Gb46.511.01computed636computedComparison: Latest 3D NAND Products from YMTC, Samsung, SK hynix and Micron
BiCS4 1.33Tb QLC (96 WL layers)Kioxia/WD20201365 Gb158.48.62computed498computedA 1.33-Tb 4-Bit/Cell 3-D Flash Memory on a 96-Word-Line-Layer Technology
176-layer TLC (replacement gate) (die area from a secondary source)Micron2020512 Gb49.8410.27computed594computedMicron B47R 3D CTF CuA NAND Die, the World's First 176L (195T)
ISSCC 2019 512Gb TLC 128 WL layers, CuA, 4-planeKioxia/WD2019512 Gb667.76computed448computed13.5 A 512Gb 3-bit/Cell 3D Flash Memory on 128-Wordline-Layer with 132MB/s Write Performance Featuring Circuit-Under-Array Technology
64-layer 256Gb TLC (Xtacking) (die area from a secondary source)YMTC2019256 Gb57.964.42computed255computedNow, YMTC is a Leading Pioneer in 3D NAND
BiCS3 512Gb TLC (Toshiba/WD, 64 WL layers)Kioxia/WD2017512 Gb1323.88computed224computed11.1 A 512Gb 3b/cell flash memory on 64-word-line-layer BiCS technology
768Gb 3b/cell 3D floating-gate NAND with CMOS under array (Micron and Intel, ISSCC 2016 paper 7.7)Micron2016768 Gb179.24.29computed248computed7.7 A 768Gb 3b/cell 3D-Floating-Gate NAND Flash Memory
14nm 128Gb MLC planar NAND (ISSCC 2016 paper 7.5)Samsung2016128 Gb1300.985computed57computed7.5 A 128Gb 2b/cell NAND Flash Memory in 14nm Technology with tPROG=640µs and 800MB/s I/O Rate
4th-gen V-NAND 512Gb TLC (64 WL)Samsung2016512 Gb128.53.98computed230computedA 512-Gb 3-b/Cell 64-Stacked WL 3-D-NAND Flash Memory
32-layer 384Gb TLC (Micron and Intel) (die area from a secondary source)Micron2015384 Gb168.22.28computed132computedIntel/Micron 64L 3D NAND Analysis
BiCS 48-layer 256Gb TLC (Toshiba) (die area from a secondary source)Kioxia/WD2015256 Gb105.42.43computed140computedToshiba 64L NAND, BiCS FLASH
16nm 64Gb MLC planar NAND (ISSCC 2014)SK hynix201364 Gb93.40.685computed40computed19.2 A 93.4mm2 64Gb MLC NAND-flash memory with 16nm CMOS technology
19nm 64Gb MLC planar NAND (ISSCC 2012)Kioxia/WD201264 Gb112.80.567computed33computedA 19nm 112.8mm2 64Gb multi-level flash memory with 400Mb/s/pin 1.8V Toggle Mode interface
24nm 64Gb MLC planar NAND (ISSCC 2011)Kioxia/WD201164 Gb1510.424computed24computedA 151mm2 64Gb MLC NAND flash memory in 24nm CMOS technology
20nm 64Gb MLC (Intel and Micron)Micron201164 Gb1180.542computed31computedIntel, Micron Extend NAND Flash Technology Leadership, Introduce Industry's Smallest, Most Advanced 20-Nanometer Process
25nm 64Gb MLC (Intel and Micron)Micron201064 Gb1670.383computed22computedIntel, Micron Introduce 25-Nanometer NAND, The Smallest, Most Advanced Process Technology in the Semiconductor Industry
32nm 32Gb MLC planar NAND (ISSCC 2010)Samsung201032 Gb1590.201computed12computedA 159mm2 32nm 32Gb MLC NAND-flash memory with 200MB/s asynchronous DDR interface
32nm 32Gb MLC planar NAND (Lee et al., ISSCC 2010)SK hynix201032 Gb1460.219computed13computedA 32Gb MLC NAND-flash memory with Vth-endurance-enhancing schemes in 32nm CMOS
34nm 32Gb MLC (Intel and Micron)Micron200832 Gb1720.186computed11computedIntel and Micron First to Deliver Sub-40 Nanometer NAND Flash Memory Device
43nm 16Gb MLC planar NAND (ISSCC 2008)Kioxia/WD200816 Gb1200.133computed7.7computedA 120mm2 16Gb 4-MLC NAND Flash Memory with 43nm CMOS Technology
56nm 8Gb MLC planar NAND (ISSCC 2006)Kioxia/WD20068 Gb98.80.081computed4.7computedA 56nm CMOS 99mm2 8Gb Multi-level NAND Flash Memory with 10MB/s Program Throughput
70nm 8Gb MLC planar NAND (JSSC 2006)Kioxia/WD20058 Gb1460.055computed3.2computedA 146-mm2 8-Gb Multi-Level NAND Flash Memory With 70-nm CMOS Technology
120nm 1Gb planar NAND (Lee et al., JSSC 2002)Samsung20021 Gb129.60.008computed0.4computedHigh-performance 1-Gb-NAND flash memory with 0.12-um technology
130nm 1Gb planar NAND (JSSC 2002)Kioxia/WD20021 Gb1250.008computed0.5computedA 125-mm2 1-Gb NAND flash memory with 10-MByte/s program speed

Left out, and why

The NAND die timeline holds 30 more dies that carry a die area. They stay out of the drawing until a saved copy of their source shows the same figure, because a die drawn to scale is a claim about its size. Their numbers are still on the timeline, each linked to where it came from.

  • BiCS4 512Gb TLC (Toshiba Memory, 96 WL layers; product interface speed from a review, secondary source)
  • XL-FLASH G1 128Gb SLC (96 WL layers)
  • ISSCC 2021 1Tb TLC 170+ WL layers, CuA, 4-plane
  • BiCS6 1Tb QLC (162 WL layers, WD/Kioxia)
  • 96L QLC 1Tb (PUC)
  • 192L FG 1.67Tb 5b/cell (PLC)
  • 96L FG 1Tb QLC (CuA; product interface speed from a review, secondary source)
  • 2nd-gen V-NAND 128Gb TLC (32 WL)
  • 3rd-gen V-NAND 256Gb TLC (48 WL)
  • 6th-gen V-NAND 512Gb TLC (product interface speed from a review, secondary source)
  • X2-9060 128-layer TLC (Xtacking 2.0; die area, density and planes from a teardown, secondary source)
  • X3-9070 1Tb TLC (Xtacking 3.0; layer count, die area and density from a teardown, secondary source)
  • 64-stacked-WL 1Tb QLC (ISSCC 2018)
  • 92-stacked-WL 1Tb QLC (ISSCC 2020 paper 13.1)
  • 128-layer 512Gb TLC (die B37R; teardown, secondary source)
  • 128-layer 512Gb TLC (single deck, die K9AHGD8U0B; teardown, secondary source)
  • 1st-gen V-NAND 128Gb MLC (24 WL) (die size and density from a Kioxia table, secondary source)
  • 32-layer 256Gb MLC (Micron and Intel) (die area from a teardown, secondary source)
  • 90nm 2Gb planar NAND (JSSC 2003)
  • 70nm 16Gb 4b/cell planar NAND (VLSI 2007)
  • 56nm 16Gb TLC planar NAND (Li et al., ISSCC 2008)
  • 56nm 16Gb MLC all-bitline NAND (ISSCC 2008)
  • Sub-35nm 32Gb TLC planar NAND (ISSCC 2009)
  • 48nm 32Gb TLC planar NAND (ISSCC 2009)
  • 43nm 64Gb 4b/cell planar NAND (ISSCC 2009)
  • 34nm 32Gb TLC planar NAND (Intel and Micron, ISSCC 2010)
  • 19nm 128Gb TLC planar NAND (ISSCC 2012)
  • Sub-20nm 64Gb MLC planar NAND (ISSCC 2012)
  • 20nm 128Gb TLC planar NAND (ISSCC 2013) (die size and density from a Toshiba table, secondary source)
  • 15nm 64Gb MLC planar NAND (ISSCC 2015)

What it will not tell you

Area is not cost. Wafer price, yield and the controller, packaging and test around the die are all missing here, and a large die is not a bad one: early planar parts were built for the process of their day. Different sources also measure a die differently, for example with or without the seal ring or the pad area, so a small gap between two dies is inside what the sources can tell apart.

Capacity is the headline figure each source prints, not usable space after spare blocks and error correction. A trend line drawn through these dies is a trend among them, not every die ever made. For a ranking, see the density ranking on the NAND die timeline.

DRAM: how to read it

A DRAM die stores one bit per cell as charge in a tiny capacitor, so its area is mostly the cell array plus the sense amplifiers and wiring around it. Teardown labs measure the finished die and publish its width, height or area, and from that and the capacity the page works out how many gigabits fit in each square millimeter.

Only one die here has a printed width and height, so it is drawn as a true rectangle; the rest are squares of their measured area. A mobile LPDDR die and a server DDR5 die are built for different jobs, so compare density across them with care.

The full list of these dies, with every other figure, is on the DRAM die timeline.

The dies at one scale6 drawn

The ruled squares are 10 mm across, and the circle is a U.S. quarter drawn at the same scale. Both boards start at 4 pixels per millimeter, near real size on a desktop screen, so hold a quarter up to the screen to compare. Drag the scale to zoom, pick a maker, or select a die for its figures.

  • Samsung
  • SK hynix
  • Micron
SK hynix D1y, DDR5 (secondary source)75.21 mm²
Samsung D1y, DDR5 (secondary source)73.58 mm²
Micron D1z, DDR5 (secondary source)66.26 mm²
Samsung D1b, LPDDR5X (secondary source)36.68 mm²
Micron Y52K D1β, DDR5 (secondary source)35.83 mm²
Micron D1α, DDR4 (secondary source)25.41 mm²
U.S. quarter, 24.26 mm
10 mm

Every die is drawn at the same scale as the quarter beside it, so a bigger box is a bigger piece of silicon. A die with a printed width and height is drawn as that rectangle; every other die is a square of the same area, because its aspect ratio was not captured.

Density by year5 dated dies

Bit density is capacity divided by die area, so a smaller die for the same capacity sits higher. It is computed here from the two printed figures, not typed in.

Bit density of the drawn dies by year (Gb/mm²)

  • Samsung
  • SK hynix
  • Micron
00.10.20.30.40.520212021.520222022.520232023.520242024.520252025.520262024: Samsung D1b, LPDDR5X (secondary source), 0.436 Gb/mm²2021: Micron D1α, DDR4 (secondary source), 0.315 Gb/mm²2022: Micron D1z, DDR5 (secondary source), 0.242 Gb/mm²2022: Samsung D1y, DDR5 (secondary source), 0.218 Gb/mm²2022: SK hynix D1y, DDR5 (secondary source), 0.213 Gb/mm²
Only the dies on this page are plotted, not every die ever made. 1 drawn die has no published date and is left off the chart.

Every figure and its source6 rows

Tap a heading to sort. Sort by capacity to rank the dies by how much each holds, or by the quarter column to rank them by how much a quarter-sized patch of each would hold, in gigabytes (gigabits over 8). Each area links to the paper, release or teardown page it was read from.

DieMakerYearCapacityArea (mm²)Gb/mm²Quarter-sized patch (GB)Source
Samsung D1b, LPDDR5X (secondary source)Samsung202416 Gb36.680.436computed25computedSamsung D1b DRAM Confirmed, Cell Size Much Smaller than Micron D1β (Nov 2024)
SK hynix D1y, DDR5 (secondary source)SK hynix202216 Gb75.210.213computed12computedIndustry-leading DDR5 Technology: Micron vs. Samsung vs. SK Hynix (TechInsights, 2022)
Samsung D1y, DDR5 (secondary source)Samsung202216 Gb73.580.218computed13computedIndustry-leading DDR5 Technology: Micron vs. Samsung vs. SK Hynix (TechInsights, 2022)
Micron D1z, DDR5 (secondary source)Micron202216 Gb66.260.242computed14computedIndustry-leading DDR5 Technology: Micron vs. Samsung vs. SK Hynix (TechInsights, 2022)
Micron D1α, DDR4 (secondary source)Micron20218 Gb25.410.315computed18computedMicron D1α, '14 nm'! The Most Advanced Node Ever on DRAM! (TechInsights, 2021)
Micron Y52K D1β, DDR5 (secondary source)Micronnot published16 Gb35.83 (6.33 × 5.66 mm)0.447computed26computedMicron Y52K D1β 16 Gb DDR5 DRAM transistor characterization (TechInsights)

Left out, and why

These dies appear in industry slides or research notes, but this page could not read their area from a source saved in the library. A die stays off the stage until its figure is confirmed from a saved copy, so a missing box means unconfirmed, not small.

  • SK hynix D1b DDR5
  • Micron D1β LPDDR5
  • CXMT G1, G3 and G4 DRAM dies
  • Micron 1γ, SK hynix 1c and Samsung 1c, for which no area has been found

What it will not tell you

These are a handful of dies, not the market. Makers rarely print die areas, so every figure here is a teardown measurement of one part, and the same part can measure slightly differently depending on whether the seal ring is counted. The Micron Y52K entry carries both the die-seal measurement and the full-die figure in its source, and the page draws the sealed one.

Area also does not show speed, power or cost.

The guides behind this data